Electrochromism in sputter deposited W1-yMoyO3thin films

Physical Properties of Reactively Sputter-Deposited C-N Thin Films

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

Metal-to-insulator transition in sputter deposited 3NiÕAl thin films

Sputter-deposited Sma Thin Films: Properties and Applications

Shape memory alloy (SMA) thin films formed by sputter deposition have attracted considerable attention in the last decade. Current intensive research demonstrated that thin films' unique fine microstructure is responsible for superior shape memory characteristics in films, compared to that of bulk materials. Simultaneously, much effort has been taken in the development and fabrication of microd...

Growth, structure and stability of sputter-deposited MoS2 thin films

Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...

Stress reduction in sputter deposited films using nanostructured compliant layers by high working-gas pressures

We present a strategy of stress reduction in sputter deposited films by a nano-compliant layer at the substrate using physically self-assembled nanostructures obtained at high working-gas pressures prior to the deposition of a continuous film. This technique is all in situ, and the nanostructures are made of the same material as the deposited thin film and requires no lithography process. This ...